This system is a tri-use FESEM imaging and inspection system, EDX elemental analysis system, and small-area electron beam lithography system. The system uses a thermal field emission source to provide a stable high beam current that is necessary for ebeam lithography applications. The accelerating voltage can be adjusted from 200V to 30kV. Using the UHR-mode of the imaging system, less than 5 nm features can be resolved at magnifications up to ~1,000,000 in as little as 10-15 minutes for experienced users. The user interface is extremely user friendly. Elemental analysis and maps linked to the SEM images can be generated with the EDAX-Falcon software. Locally-aligned electron beam lithography can be done to ~15 nm resolution through the integrated Nabity v9 hardware and software. A beam blanker operating at ~1MHz is used to shutter the electron beam on and off for writing applications. Special training, above and beyond SEM training, is required for doing lithography or EDX work. Large area and precision electron-beam writing jobs should be done on our JEOL electron beam writing system.
Contact Tom Reynolds to find out more about access and training for the Nanofabrication Facility.